US 11,732,345 B2
Vapor deposition apparatus and method for coating a substrate in a vacuum chamber
Stefan Bangert, Steinau (DE); and Andreas Lopp, Freigericht (DE)
Assigned to APPLIED MATERIALS, INC., Santa Clara, CA (US)
Filed by Applied Materials, Inc., Santa Clara, CA (US)
Filed on May 27, 2021, as Appl. No. 17/332,845.
Claims priority of provisional application 63/034,548, filed on Jun. 4, 2020.
Prior Publication US 2021/0381095 A1, Dec. 9, 2021
Int. Cl. C23C 14/24 (2006.01); C23C 14/16 (2006.01); C23C 14/54 (2006.01); C23C 14/04 (2006.01); B05B 12/16 (2018.01); B05C 21/00 (2006.01); H01J 37/32 (2006.01)
CPC C23C 14/24 (2013.01) [B05B 12/16 (2018.02); B05C 21/005 (2013.01); C23C 14/042 (2013.01); C23C 14/16 (2013.01); C23C 14/54 (2013.01); H01J 37/32752 (2013.01)] 18 Claims
OG exemplary drawing
 
1. A vapor deposition apparatus, comprising:
a substrate support for supporting a substrate to be coated;
a vapor source with a plurality of nozzles for directing vapor toward the substrate support through a vapor propagation volume; and
a heatable shield mounted at the vapor source, protruding from the vapor source toward the substrate support, at least partially surrounding the vapor propagation volume and forming a side wall of the vapor propagation volume, wherein the heatable shield comprises an edge exclusion portion for masking areas of the substrate not to be coated, wherein the substrate support is a rotatable drum with a curved drum surface, the edge exclusion portion extending along the curved drum surface and following a curvature thereof.