US 11,731,241 B2
Substrate rotation device, substrate cleaning device, substrate processing device, and control method for substrate rotation device
Ichiju Satoh, Tokyo (JP); and Toshimitsu Barada, Tokyo (JP)
Assigned to EBARA CORPORATION, Tokyo (JP)
Filed by Ebara Corporation, Tokyo (JP)
Filed on Aug. 8, 2019, as Appl. No. 16/535,325.
Claims priority of application No. 2018-151378 (JP), filed on Aug. 10, 2018.
Prior Publication US 2020/0047310 A1, Feb. 13, 2020
Int. Cl. B24B 53/017 (2012.01); F16C 32/04 (2006.01); B24B 37/10 (2012.01); B24B 37/005 (2012.01)
CPC B24B 53/017 (2013.01) [B24B 37/005 (2013.01); B24B 37/10 (2013.01); F16C 32/044 (2013.01)] 12 Claims
OG exemplary drawing
 
1. A substrate rotation device comprising:
an outer cylinder;
an inner cylinder positioned inside the outer cylinder;
a motor for rotating the inner cylinder;
a magnetic bearing for magnetically levitating the inner cylinder; and
a substrate holder disposed on the inner cylinder,
wherein the motor is a radial motor and includes:
a motor stator mounted on the outer cylinder, and
a motor rotor mounted on the inner cylinder,
the magnetic bearing is a radial magnetic bearing and includes:
a magnetic bearing stator mounted on the outer cylinder, and
a magnetic bearing rotor mounted on the inner cylinder, and
the magnetic bearing is configured to magnetically levitate the inner cylinder with an attractive force between the magnetic bearing stator and the magnetic bearing rotor.