US 11,730,199 B2
Cartridges for vaporizer devices
Ariel Atkins, San Francisco, CA (US); Adam Bowen, San Mateo, CA (US); Steven Christensen, San Mateo, CA (US); Esteban Leon Duque, San Francisco, CA (US); and James Monsees, San Francisco, CA (US)
Assigned to JUUL Labs, Inc., Washington, DC (US)
Filed by JUUL Labs, Inc., San Francisco, CA (US)
Filed on Jun. 7, 2019, as Appl. No. 16/435,162.
Claims priority of provisional application 62/848,681, filed on May 16, 2019.
Claims priority of provisional application 62/682,144, filed on Jun. 7, 2018.
Prior Publication US 2019/0373953 A1, Dec. 12, 2019
Int. Cl. A24F 40/46 (2020.01); A24F 40/44 (2020.01); A24F 40/10 (2020.01); A61M 11/04 (2006.01); A61M 15/06 (2006.01); A24F 40/485 (2020.01); A61M 15/00 (2006.01)
CPC A24F 40/46 (2020.01) [A24F 40/44 (2020.01); A24F 40/485 (2020.01); A24F 40/10 (2020.01); A61M 15/0001 (2014.02)] 17 Claims
OG exemplary drawing
 
1. A cartridge for a vaporizer device, the cartridge comprising:
a reservoir housing including a reservoir chamber configured to selectively hold a vaporizable material; and
an atomizer in fluid communication with the reservoir chamber, the atomizer comprising,
a porous substrate configured to draw the vaporizable material from the reservoir chamber, the porous substrate comprising at least one vent extending therethrough, the at least one vent being configured to allow the passage of air into the reservoir chamber in response to the withdrawal of at least a portion of the vaporizable material from the reservoir chamber, and
at least one surface heater configured to heat at least a portion of vaporizable material drawn into the porous substrate into a vaporized vaporizable material, the at least one surface heater comprising at least one electrically conductive layer deposited on a portion of the porous substrate;
wherein the at least one vent has a first portion with a first cross-sectional area and a second portion with a second cross-sectional area that is less than the first cross-sectional area, and wherein the first portion is adjacent to the reservoir chamber and the second portion is distal to the reservoir chamber.