CPC H05G 2/008 (2013.01) [G02B 5/0891 (2013.01); G02B 5/208 (2013.01); G03F 7/70033 (2013.01); G03F 7/70191 (2013.01); G03F 7/70308 (2013.01); G03F 7/70958 (2013.01)] | 20 Claims |
1. An apparatus for generating extreme ultraviolet light, the apparatus comprising:
a raw material supply unit configured to supply a plasma source for generating extreme ultraviolet (EUV) light;
an extreme ultraviolet light source unit configured to supply a laser beam to generate plasma from the plasma source;
a filter having a front surface, on which light generated from the plasma is incident, and a rear surface, disposed opposite to the front surface, and configured to extract extreme ultraviolet light from the light;
a first protective layer disposed on the front surface of the filter; and
a frame having a first region exposing at least a portion of the filter or the first protective layer and disposed on the first protective layer,
wherein a width of the first region, in a direction parallel to the front surface of the filter, is smaller than a width of the first protective layer, in the direction parallel to the front surface of the filter, and smaller than or equal to a width of the filter in the direction parallel to the from surface of the filter.
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