US 11,729,896 B2
Apparatus for generating extreme ultraviolet (EUV), method of manufacturing the same, and EUV system
Jihoon Na, Bucheon-si (KR); Mun Ja Kim, Hwaseong-si (KR); Jaewhan Sung, Suwon-si (KR); Byungchul Yoo, Yongin-si (KR); Jibeom Yoo, Hwaseong-si (KR); Hakseok Lee, Hwaseong-si (KR); Myeongjin Jeong, Hwaseong-si (KR); and Hyunjune Cho, Suwon-si (KR)
Assigned to SAMSUNG ELECTRONICS CO., LTD., Suwon-si (KR); and RESEARCH BUSINESS FOUNDATION SUNGKYUNKWAN UNIVERSITY, Suwon-si (KR)
Filed by SAMSUNG ELECTRONICS CO., LTD., Suwon-si (KR)
Filed on Sep. 7, 2021, as Appl. No. 17/468,644.
Claims priority of application No. 10-2020-0161243 (KR), filed on Nov. 26, 2020.
Prior Publication US 2022/0167492 A1, May 26, 2022
Int. Cl. H05G 2/00 (2006.01); G03F 7/20 (2006.01); G02B 5/20 (2006.01); G02B 5/08 (2006.01); G03F 7/00 (2006.01)
CPC H05G 2/008 (2013.01) [G02B 5/0891 (2013.01); G02B 5/208 (2013.01); G03F 7/70033 (2013.01); G03F 7/70191 (2013.01); G03F 7/70308 (2013.01); G03F 7/70958 (2013.01)] 20 Claims
OG exemplary drawing
 
1. An apparatus for generating extreme ultraviolet light, the apparatus comprising:
a raw material supply unit configured to supply a plasma source for generating extreme ultraviolet (EUV) light;
an extreme ultraviolet light source unit configured to supply a laser beam to generate plasma from the plasma source;
a filter having a front surface, on which light generated from the plasma is incident, and a rear surface, disposed opposite to the front surface, and configured to extract extreme ultraviolet light from the light;
a first protective layer disposed on the front surface of the filter; and
a frame having a first region exposing at least a portion of the filter or the first protective layer and disposed on the first protective layer,
wherein a width of the first region, in a direction parallel to the front surface of the filter, is smaller than a width of the first protective layer, in the direction parallel to the front surface of the filter, and smaller than or equal to a width of the filter in the direction parallel to the from surface of the filter.