US 11,728,777 B2
RF power source with improved galvanic isolation
Tim Hardy, Halifax (CA); Brian Walker, Halifax (CA); Kirk Zwicker, Halifax (CA); and Charles Schue, Halifax (CA)
Assigned to AETHERA TECHNOLOGIES LIMITED, Halifax (CA)
Filed by Aethera Technologies Limited, Halifax (CA)
Filed on May 21, 2021, as Appl. No. 17/326,994.
Claims priority of provisional application 63/034,647, filed on Jun. 4, 2020.
Prior Publication US 2021/0384877 A1, Dec. 9, 2021
Int. Cl. H03F 3/24 (2006.01); H03F 3/217 (2006.01); H04B 1/04 (2006.01)
CPC H03F 3/245 (2013.01) [H03F 3/2176 (2013.01); H04B 1/04 (2013.01); H03F 2200/451 (2013.01); H03F 2200/459 (2013.01)] 20 Claims
OG exemplary drawing
 
1. An RF (Radio Frequency) power source, comprising:
a power supply configured to convert an AC (Alternating Current) voltage at a power supply input to a second voltage at a power supply output, without galvanic isolation between the power supply input and the power supply output; and
an RF generator configured to receive the second voltage at an RF generator input and to use the second voltage to produce an output RF signal at an RF generator output, with galvanic isolation between the RF generator input and the RF generator output;
wherein the RF generator comprises a plurality of RF power amplifiers each configured to use the second voltage to produce an individual RF signal, and a power combiner configured to combine each individual RF signal to produce the output RF signal.