CPC H01J 37/32412 (2013.01) [H01J 37/08 (2013.01)] | 20 Claims |
1. An ion source for an ion implantation system, the ion source comprising:
an arc chamber defining an arc chamber volume;
a reservoir operably coupled to the arc chamber and defining a reservoir volume, wherein the reservoir volume is configured to contain a liquid therein;
a conduit fluidly coupling the reservoir volume to the arc chamber volume, wherein the conduit has a first opening and a second opening, wherein the first opening is operably coupled to the reservoir, and wherein the second opening is elevated from the first opening and open to the arc chamber volume; and
a liquid control apparatus operably coupled to the reservoir, wherein the liquid control apparatus is configured to control a first volume of the liquid defined within the reservoir volume, and wherein the first volume of the liquid within the reservoir volume further defines a predetermined supply of the liquid to the arc chamber volume.
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