CPC G03F 7/162 (2013.01) [G03F 7/168 (2013.01); G03F 7/2028 (2013.01)] | 14 Claims |
1. A method of coating a photoresist, the method comprising:
providing the photoresist on an upper surface of a wafer, the wafer being rotated; and
injecting a hovering solution toward an edge portion of the photoresist under a hovering condition such that the hovering solution hovers with respect to the edge portion of the photoresist on an edge portion of the upper surface of the wafer with an air layer between the hovering solution and the photoresist to prevent a bead of the photoresist from forming on the edge portion of the upper surface of the wafer.
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