US 11,724,356 B2
Porous polyurethane polishing pad and preparation method thereof
Jang Won Seo, Busan (KR); Hyuk Hee Han, Gyeonggi-do (KR); Hye Young Heo, Gyeonggi-do (KR); Joonsung Ryou, Gyeonggi-do (KR); and Young Pil Kwon, Gyeonggi-do (KR)
Assigned to SK enpulse Co., Ltd., Gyeonggi-do (KR)
Filed by SK enpulse Co., Ltd., Gyeonggi-do (KR)
Filed on Aug. 22, 2018, as Appl. No. 16/108,607.
Claims priority of application No. 10-2017-0106466 (KR), filed on Aug. 23, 2017.
Prior Publication US 2019/0061097 A1, Feb. 28, 2019
Int. Cl. B24B 37/24 (2012.01); C08L 75/04 (2006.01); H01L 21/67 (2006.01); C08G 18/76 (2006.01); C08G 18/18 (2006.01); C08G 18/62 (2006.01); C08G 18/20 (2006.01); C08J 9/12 (2006.01); C08J 9/00 (2006.01); C08G 18/75 (2006.01); C08G 18/48 (2006.01); B24D 11/04 (2006.01); C08G 18/24 (2006.01); C08G 18/42 (2006.01); C08G 18/73 (2006.01); C08J 9/32 (2006.01); C08G 18/44 (2006.01)
CPC B24B 37/24 (2013.01) [B24D 11/04 (2013.01); C08G 18/1816 (2013.01); C08G 18/1825 (2013.01); C08G 18/1833 (2013.01); C08G 18/2018 (2013.01); C08G 18/2081 (2013.01); C08G 18/244 (2013.01); C08G 18/246 (2013.01); C08G 18/42 (2013.01); C08G 18/44 (2013.01); C08G 18/48 (2013.01); C08G 18/6216 (2013.01); C08G 18/73 (2013.01); C08G 18/755 (2013.01); C08G 18/757 (2013.01); C08G 18/7614 (2013.01); C08G 18/7621 (2013.01); C08G 18/7671 (2013.01); C08G 18/7678 (2013.01); C08G 18/7685 (2013.01); C08J 9/0028 (2013.01); C08J 9/0042 (2013.01); C08J 9/0052 (2013.01); C08J 9/122 (2013.01); C08J 9/32 (2013.01); C08L 75/04 (2013.01); H01L 21/67092 (2013.01); C08G 2110/005 (2021.01); C08G 2110/0025 (2021.01); C08J 2201/026 (2013.01); C08J 2203/06 (2013.01); C08J 2203/22 (2013.01); C08J 2205/044 (2013.01); C08J 2375/04 (2013.01)] 9 Claims
OG exemplary drawing
 
1. A porous polyurethane polishing pad, which comprises a polyurethane resin and pores distributed in the polyurethane resin,
wherein in the pore size distribution of the pores based on the cross-sectional area of the polishing pad, the pore size at the maximum peak is smaller than the average pore size,
the pore size at the maximum peak is 18 to 28 μm,
the average pore size is 24 to 36 μm, and
the sum of the cross-sectional areas of the pores having a pore size larger than the pore size at the maximum peak by 15 μm or more is larger than the sum of the cross-sectional areas of the pores having a pore size larger than the pore size at the maximum peak by 10 μm to less than 15 μm,
wherein the porous polyurethane polishing pad contains the pores in an amount of 30 to 70% by volume based on the total volume of the polishing pad, and
wherein the porous polyurethane polishing pad has a tensile strength of 10 to 100 kgf/cm2 and an elongation of 30% to 300%.