CPC B24B 31/006 (2013.01) [B23B 35/00 (2013.01); B24B 5/40 (2013.01); B24B 31/003 (2013.01); B24B 31/116 (2013.01); B24B 33/02 (2013.01); B24B 57/04 (2013.01); B23B 2220/445 (2013.01); B23B 2226/18 (2013.01)] | 11 Claims |
1. A method of manufacturing a plasma-resistant chamber component of a processing chamber, the method comprising: polishing at least one aperture of the plasma-resistant chamber component, the component disposed inside a ring between a mounting stage and a clamp, wherein a pump configured to flow an abrasive media is fluidly coupled to the plasma-resistant chamber component by the mounting stage, polishing the at least one aperture of the plasma-resistant chamber component by flowing the abrasive media along a first abrasive media flow path from the mounting stage to the clamp through the at least one aperture of the plasma-resistant chamber component and along a second abrasive media flow path between an outer surface of the plasma-resistant chamber component and an inner surface of the ring, and wherein the abrasive media comprises a polymer base and a plurality of abrasive particles.
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