US 10,376,608 B1
Ultraviolet disinfection system
Douglas A. Collins, Hayward, CA (US); Yitao Liao, Redwood City, CA (US); and Robert S. West, Pleasanton, CA (US)
Assigned to RayVio Corporation, Hayward, CA (US)
Filed by RayVio Corporation, Hayward, CA (US)
Filed on Dec. 1, 2016, as Appl. No. 15/367,009.
Application 15/367,009 is a continuation of application No. 14/733,494, filed on Jun. 8, 2015, granted, now 9,540,252.
Int. Cl. C02F 1/32 (2006.01); A61L 9/20 (2006.01)
CPC A61L 9/20 (2013.01) [A61L 9/205 (2013.01); C02F 1/325 (2013.01); A61L 2209/14 (2013.01); C02F 2201/3228 (2013.01); C02F 2303/04 (2013.01)] 19 Claims
OG exemplary drawing
1. A structure comprising:
an enlongated chamber defined by at least one sidewall substantially parallel to a fluid flow;
a reflective first fluid permeable structure forming a first end wall of the chamber;
a reflective second fluid permeable structure forming an opposing second end wall of the chamber, with the at least one sidewall between the first fluid permeable structure and the second permeable structure; and
an ultraviolet (UV) source comprising a semiconductor device comprising an active layer disposed between an n-type region and a p-type region, wherein the active layer emits radiation having a peak wavelength in a UV range, wherein
the semiconductor device is positioned on the sidewall, wherein the semiconductor device is substantially flush with the sidewall or disposed at a lower elevation than the sidewall such that the semiconductor device does not extend into the chamber.