US RE49,602 E1
Lithography system, sensor and measuring method
Pieter Kruit, Delft (NL); Erwin Slot, Zoetermeer (NL); Tijs Frans Teepen, Tilburg (NL); Marco Jan-Jaco Wieland, Delft (NL); and Stijn Willem Herman Karel Steenbrink, Den Hague (NL)
Assigned to ASML Netherlands B.V., Veldhoven (NL)
Filed by ASML NETHERLANDS B.V., Veldhoven (NL)
Filed on Sep. 2, 2020, as Appl. No. 16/896,953.
Application 14/469,544 is a division of application No. 13/738,947, filed on Jan. 10, 2013, granted, now RE45206, issued on Oct. 28, 2014.
Application 11/521,705 is a continuation of application No. 14/469,544, filed on Aug. 26, 2014, granted, now RE48046.
Application 16/896,953 is a reissue of application No. 11/521,705, filed on Sep. 14, 2006, granted, now 7,868,300, issued on Jan. 11, 2011.
Application 13/738,947 is a reissue of application No. 11/521,705, filed on Sep. 14, 2006, granted, now 7,868,300, issued on Jan. 11, 2011.
Claims priority of provisional application 60/718,143, filed on Sep. 15, 2005.
This patent is subject to a terminal disclaimer.
Int. Cl. H01J 3/00 (2006.01); H01J 37/317 (2006.01); B82Y 10/00 (2011.01); B82Y 40/00 (2011.01); H01J 37/304 (2006.01)
CPC H01J 37/3177 (2013.01) [B82Y 10/00 (2013.01); B82Y 40/00 (2013.01); H01J 37/3045 (2013.01); H01J 2237/2443 (2013.01); H01J 2237/2446 (2013.01); H01J 2237/30433 (2013.01); H01J 2237/31757 (2013.01)] 20 Claims
OG exemplary drawing
 
[ 38. A multi-beam charged particle system comprising a multi beam charged particle tool configured to generate multiple charged particle beams, the system comprising:
a sensor configured to detect the charged particle beams, the sensor comprising:
a structure comprising a plurality of patterns that are equally oriented and periodically arranged, wherein one or more patterns of the plurality of patterns are assigned per beam among the multiple charged particle beams,
wherein the structure is configured to selectively block the charged particle beams partially or entirely.]