US 11,723,262 B2
Substrate for flexible device and method for producing the same
Toshihiko Miyazaki, Osaka (JP); Hirohisa Masuda, Osaka (JP); Hiroshi Shimomura, Osaka (JP); and Kouji Nanbu, Kudamatsu (JP)
Assigned to TOYO SEIKAN GROUP HOLDINGS, LTD., Tokyo (JP)
Filed by TOYO SEIKAN GROUP HOLDINGS, LTD., Tokyo (JP)
Filed on Jul. 15, 2021, as Appl. No. 17/377,246.
Application 17/377,246 is a division of application No. 16/088,273, granted, now 11,101,436, previously published as PCT/JP2017/011448, filed on Mar. 22, 2017.
Claims priority of application No. 2016-063335 (JP), filed on Mar. 28, 2016; application No. 2016-063337 (JP), filed on Mar. 28, 2016; application No. 2016-063341 (JP), filed on Mar. 28, 2016; application No. 2017-037333 (JP), filed on Feb. 28, 2017; application No. 2017-042159 (JP), filed on Mar. 6, 2017; and application No. 2017-042160 (JP), filed on Mar. 6, 2017.
Prior Publication US 2021/0343956 A1, Nov. 4, 2021
This patent is subject to a terminal disclaimer.
Int. Cl. H10K 77/10 (2023.01); C03C 3/066 (2006.01); C03C 3/068 (2006.01); C03C 3/14 (2006.01); H10K 50/828 (2023.01); H10K 71/00 (2023.01); C03C 8/04 (2006.01); C03C 8/16 (2006.01); H10K 30/80 (2023.01); H10K 102/00 (2023.01)
CPC H10K 77/111 (2023.02) [C03C 3/066 (2013.01); C03C 3/068 (2013.01); C03C 3/14 (2013.01); C03C 8/04 (2013.01); C03C 8/16 (2013.01); H10K 50/828 (2023.02); H10K 71/00 (2023.02); C03C 2207/00 (2013.01); H10K 30/80 (2023.02); H10K 2102/00 (2023.02); H10K 2102/311 (2023.02); H10K 2102/351 (2023.02); Y10T 428/12618 (2015.01)] 8 Claims
OG exemplary drawing
 
1. A sheet for a flexible device, the sheet including either a nickel-plated metal sheet including a nickel-plating layer formed on at least one surface of a metal sheet or a nickel-based sheet, wherein a roughened oxide layer is formed on either the surface of the nickel-plating layer or the surface of the nickel-based sheet,
wherein the oxide layer has an arithmetic mean roughness (Ra) in a range of 30 to 100 nm, and
wherein the oxide layer has a surface having maximum height roughness (Rz) in a range of 420 to 900 nm.