US 11,723,141 B2
EUV radiation generation methods and systems
Chun-Lin Louis Chang, Hsinchu County (TW); Jen-Hao Yeh, Hsinchu (TW); Tzung-Chi Fu, Miaoli County (TW); Bo-Tsun Liu, Taipei (TW); Li-Jui Chen, Hsinchu (TW); and Po-Chung Cheng, Chiayi County (TW)
Assigned to TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD., Hsinchu (TW)
Filed by Taiwan Semiconductor Manufacturing Co., Ltd., Hsinchu (TW)
Filed on Aug. 8, 2022, as Appl. No. 17/818,210.
Application 17/818,210 is a continuation of application No. 17/248,785, filed on Feb. 8, 2021, granted, now 11,419,203.
Application 17/248,785 is a continuation of application No. 16/587,018, filed on Sep. 29, 2019, granted, now 10,917,959, issued on Feb. 9, 2021.
Application 16/587,018 is a continuation of application No. 15/883,234, filed on Jan. 30, 2018, granted, now 10,429,729, issued on Oct. 1, 2019.
Claims priority of provisional application 62/491,363, filed on Apr. 28, 2017.
Prior Publication US 2022/0386440 A1, Dec. 1, 2022
This patent is subject to a terminal disclaimer.
Int. Cl. H05G 2/00 (2006.01); G03F 7/00 (2006.01)
CPC H05G 2/008 (2013.01) [G03F 7/70033 (2013.01)] 20 Claims
OG exemplary drawing
 
1. A method, comprising:
providing a beam from a laser source;
modifying a shape of the beam to form a modified beam, wherein the modifying the shape of the beam includes:
providing the beam in a Gaussian shape; and
passing the Gaussian shape beam through a beam-shaping unit, the beam-shaping unit including an opening that defines an inner and outer diameter of a ring-shape; and
performing a process to generate an extreme ultraviolet (EUV) light using the modified beam.