US 11,721,550 B2
Methods for depositing III-alloys on substrates and compositions therefrom
Emily Lowell Warren, Golden, CO (US); Jeramy David Zimmerman, Golden, CO (US); and Olivia Dean Schneble, Golden, CO (US)
Assigned to United States Department of Energy, Washington, DC (US)
Filed by United States Department of Energy, Washington, DC (US); and COLORADO SCHOOL OF MINES, Golden, CO (US)
Filed on Oct. 7, 2021, as Appl. No. 17/495,913.
Claims priority of provisional application 63/088,630, filed on Oct. 7, 2020.
Prior Publication US 2022/0108889 A1, Apr. 7, 2022
Int. Cl. H01L 21/00 (2006.01); H01L 21/02 (2006.01)
CPC H01L 21/02653 (2013.01) [H01L 21/02381 (2013.01); H01L 21/02392 (2013.01); H01L 21/02543 (2013.01); H01L 21/02546 (2013.01); H01L 21/0243 (2013.01); H01L 21/02164 (2013.01); H01L 21/02208 (2013.01); H01L 21/02211 (2013.01); H01L 21/02282 (2013.01); H01L 21/02433 (2013.01); H01L 21/02634 (2013.01)] 15 Claims
OG exemplary drawing
 
1. A method comprising:
a depositing of a second layer comprising silica onto a first layer comprising a Group III element and a substrate having a surface; and
exposing the second layer to a precursor comprising a Group V element, resulting in the transforming of the first layer to a solid layer comprising a III-V alloy, wherein:
the depositing is performed by a sol-gel method,
the exposing converts at least a portion of the first layer to a liquid,
at least one of the precursor or the Group V element diffuse through the silica, and the silica retains the liquified first layer, enabling at least one of the precursor or the Group V element to diffuse into the liquid, resulting in the forming of the III-V alloy.