US 11,721,539 B2
Arc lamp with forming gas for thermal processing systems
Michael X. Yang, Palo Alto, CA (US); Rolf Bremensdorfer, Palo Alto, CA (US); Dave Camm, Palo Alto, CA (US); Joseph Cibere, Palo Alto, CA (US); Dieter Hezler, Palo Alto, CA (US); Shawming Ma, Palo Alto, CA (US); and Yun Yang, Palo Alto, CA (US)
Assigned to BEIJING E-TOWN SEMICONDUCTOR TECHNOLOGY CO., LTD., Beijing (CN); and MATTSON TECHNOLOGY, INC, Fremont, CA (US)
Filed by Mattson Technology, Inc., Fremont, CA (US); and Beijing E-Town Semiconductor Technology Co., Ltd., Beijing (CN)
Filed on Nov. 23, 2021, as Appl. No. 17/533,593.
Claims priority of provisional application 63/117,597, filed on Nov. 24, 2020.
Prior Publication US 2022/0165561 A1, May 26, 2022
Int. Cl. H01J 61/073 (2006.01); H01J 61/86 (2006.01); H05H 1/48 (2006.01); H01J 61/52 (2006.01); H01J 61/28 (2006.01)
CPC H01J 61/86 (2013.01) [H01J 61/0732 (2013.01); H01J 61/28 (2013.01); H01J 61/526 (2013.01); H05H 1/48 (2013.01)] 14 Claims
OG exemplary drawing
 
1. An arc lamp, comprising:
a tube:
one or more inlets configured to receive water to be circulated through the arc lamp during operation as a water wall, the water wall configured to cool the arc lamp;
a plurality of electrodes configured to generate a plasma in a forming gas introduced into the tube via the one or more inlets; and
the forming gas comprising a mixture of a hydrogen gas and an inert gas, the hydrogen gas in the mixture having a concentration less than 4% by volume, the hydrogen gas introduced into the arc lamp prior to generating the plasma,
wherein the plurality of electrodes comprises a tip and a heat sink at least partially around the tip, wherein the tip of at least one of the plurality of electrodes comprises tantalum hafnium carbide.