US 11,721,527 B2
Processing chamber mixing systems
Ganesh Subbuswamy, Bangalore (IN); and Steven P. Warnert, San Jose, CA (US)
Assigned to Applied Materials, Inc., Santa Clara, CA (US)
Filed by Applied Materials, Inc., Santa Clara, CA (US)
Filed on Jan. 7, 2019, as Appl. No. 16/241,537.
Prior Publication US 2020/0215566 A1, Jul. 9, 2020
This patent is subject to a terminal disclaimer.
Int. Cl. H01J 37/32 (2006.01); H01L 21/306 (2006.01); B05C 11/10 (2006.01); B05C 5/02 (2006.01); C23C 16/50 (2006.01); C23C 16/455 (2006.01)
CPC H01J 37/3244 (2013.01) [H01J 37/32357 (2013.01); H01L 21/30604 (2013.01); B05C 5/0212 (2013.01); B05C 11/1002 (2013.01); C23C 16/45512 (2013.01); C23C 16/50 (2013.01)] 20 Claims
OG exemplary drawing
 
1. A processing system comprising:
a processing chamber;
a remote plasma generator coupled with the processing chamber; and
a baffle plate incorporated between the processing chamber and the remote plasma generator; and
a mixing manifold coupled between the remote plasma generator and the processing chamber, wherein:
the mixing manifold is a single-piece component;
the mixing manifold is characterized by a first end and a second end opposite the first end;
the mixing manifold is coupled with the processing chamber at the second end;
the mixing manifold defines a central channel extending from the first end to the second end through the mixing manifold;
the mixing manifold defines a port along an exterior surface between the first end and the second end of the mixing manifold;
the port is fluidly coupled with a first trench defined within a first exterior surface of the first end of the mixing manifold facing the remote plasma generator;
the first trench is characterized by an inner radius at a first inner sidewall and an outer radius; wherein the first inner sidewall comprises a chamfered surface, and a plurality of apertures are defined through the first inner sidewall, the plurality of apertures extending through the chamfered surface and fluidly coupling the first trench with the central channel;
the first exterior surface defines a second trench that is located radially outward from the first trench; and
the port is fluidly coupled with the second trench.
 
20. A mixing manifold, comprising:
a single-piece component having a first end and a second end opposite the first end;
a central channel extending from the first end to the second end through the mixing manifold;
a first trench formed within a first exterior surface of the first end of the mixing manifold; the first trench is characterized by an inner radius at a first inner sidewall and an first outer radius; wherein the first inner sidewall comprises a chamfered surface, and a plurality of first apertures are formed through the first inner sidewall, the plurality of first apertures extending through the chamfered surface and fluidly coupling the first trench with the central channel;
a second trench formed within the first exterior surface of the first end of the mixing manifold located radially outward from the first trench; wherein the second trench is characterized by an inner radius at a second inner sidewall and a second outer radius, wherein the second inner sidewall further defines the first outer radius of the first trench, and a plurality of second apertures are formed through the second inner sidewall and fluidly coupling the second trench with the first trench; and
a port along an exterior surface between the first end and the second end of the mixing manifold, the port is fluidly coupled with the second trench.