US 11,721,095 B2
Machine learning for quantum material synthesis
Kin Chung Fong, Cambridge, MA (US); Man-Hung Siu, Lexington, MA (US); and Zhuolin Jiang, Cambridge, MA (US)
Assigned to RAYTHEON BBN TECHNOLOGIES CORP., Cambridge, MA (US)
Filed by RAYTHEON BBN TECHNOLOGIES CORP., Cambridge, MA (US)
Filed on Nov. 22, 2022, as Appl. No. 17/992,815.
Application 17/992,815 is a continuation of application No. 16/420,100, filed on May 22, 2019, granted, now 11,537,822.
Claims priority of provisional application 62/675,728, filed on May 23, 2018.
Prior Publication US 2023/0091882 A1, Mar. 23, 2023
This patent is subject to a terminal disclaimer.
Int. Cl. G06V 10/82 (2022.01); G06N 3/04 (2023.01); C01B 32/19 (2017.01); G06F 18/24 (2023.01); G06V 20/69 (2022.01)
CPC G06V 10/82 (2022.01) [C01B 32/19 (2017.08); G06F 18/24 (2023.01); G06N 3/0418 (2013.01); G06V 20/698 (2022.01)] 20 Claims
OG exemplary drawing
 
1. A method for classifying images, the method comprising:
forming a micrograph of a surface; and
classifying the micrograph into one of a plurality of categories, the categories including:
a first category, consisting of micrographs including at least one monolayer flake, and
a second category, consisting of micrographs including at least one bilayer flakes, and
the classifying comprising classifying the micrograph with a neural network.