US 11,721,013 B2
Information processing apparatus, determination method, imprint apparatus, lithography system, article manufacturing method, and non-transitory computer-readable storage medium
Shinichiro Koga, Utsunomiya (JP); and Mitsuhiro Masuda, Utsunomiya (JP)
Assigned to CANON KABUSHIKI KAISHA, Tokyo (JP)
Filed by CANON KABUSHIKI KAISHA, Tokyo (JP)
Filed on Sep. 17, 2020, as Appl. No. 17/23,867.
Claims priority of application No. 2019-180717 (JP), filed on Sep. 30, 2019.
Prior Publication US 2021/0097675 A1, Apr. 1, 2021
Int. Cl. G06T 7/00 (2017.01); G06N 20/00 (2019.01); G01N 21/88 (2006.01); G06N 3/08 (2023.01)
CPC G06T 7/0008 (2013.01) [G01N 21/8806 (2013.01); G06N 3/08 (2013.01); G06N 20/00 (2019.01); G01N 2021/8825 (2013.01); G06T 2207/30148 (2013.01)] 18 Claims
OG exemplary drawing
 
1. An information processing apparatus for determining, for a substrate having undergone an imprint process that forms a pattern of an imprint material on the substrate by using a mold, presence/absence of a formation defect of the pattern, comprising:
a generating unit configured to generate learning models in one-to-one correspondence with a plurality of different illumination conditions by using images obtained by capturing images of a plurality of substrates on which the pattern is formed under the plurality of illumination conditions, and containing the pattern;
an obtaining unit configured to input the images obtained by capturing images of the substrates having undergone the imprint process and containing the pattern, to a plurality of learning models generated by the generating unit, and obtain a temporary determination result temporarily indicating the presence/absence of a formation defect of the pattern from each of the plurality of learning models; and
a determination unit configured to determine the presence/absence of a formation defect of the pattern on the substrate having undergone the imprint process, based on a plurality of temporary determination results obtained by the obtaining unit.