CPC G03F 7/70925 (2013.01) [G03F 7/70025 (2013.01); G03F 7/70033 (2013.01); G03F 7/70916 (2013.01); G03F 7/70975 (2013.01)] | 20 Claims |
1. An apparatus for manufacturing semiconductors, comprising
a power amplifier to power a laser;
a catalyst disposed in the power amplifier;
a supply of mixing gas;
circuitry configured to control a cleaning operation on the power amplifier;
an inlet port controlled by the circuitry, the inlet port coupled to the supply to introduce a mixing gas to an interior of the power amplifier during the cleaning operation so that the mixing gas contacts a surface of the catalyst having a build-up thereon, whereby the mixing gas reacts with and removes the build-up by generating gaseous by-products;
an exhaust port controlled by the circuitry and configured to remove the gaseous by-products from the power amplifier at an end of the cleaning operation; and
a filter having a water supply and configured to receive the gaseous by-products from the exhaust port, whereby the water supply removes and recovers the mixing gas from the gaseous by-products.
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