US 11,720,024 B2
Resist underlayer film-forming composition containing indolocarbazole novolak resin
Hikaru Tokunaga, Toyama (JP); Daigo Saito, Toyama (JP); Keisuke Hashimoto, Toyama (JP); and Rikimaru Sakamoto, Toyama (JP)
Assigned to NISSAN CHEMICAL INDUSTRIES, LTD., Tokyo (JP)
Filed by NISSAN CHEMICAL INDUSTRIES, LTD., Tokyo (JP)
Filed on Aug. 4, 2022, as Appl. No. 17/880,761.
Application 17/880,761 is a division of application No. 15/780,657, abandoned, previously published as PCT/JP2016/085561, filed on Nov. 30, 2016.
Claims priority of application No. 2015-235002 (JP), filed on Dec. 1, 2015.
Prior Publication US 2022/0404707 A1, Dec. 22, 2022
Int. Cl. G03F 7/11 (2006.01); G03F 7/40 (2006.01); G03F 7/20 (2006.01); C08G 12/26 (2006.01); C08G 16/02 (2006.01); C09D 161/26 (2006.01); H01L 21/027 (2006.01)
CPC G03F 7/11 (2013.01) [C08G 12/26 (2013.01); C08G 16/0268 (2013.01); C09D 161/26 (2013.01); G03F 7/2002 (2013.01); G03F 7/2059 (2013.01); G03F 7/40 (2013.01); H01L 21/0274 (2013.01)] 8 Claims
 
1. A resist underlayer film containing a polymer consisting of unit structure of the following formula (1):

OG Complex Work Unit Chemistry
wherein A is a divalent group having at least two amino groups, the divalent group is derived from a compound having an indolocarbazole structure, B1 is a hydrogen atom, and B2 is a hydrogen atom, an alkyl group, a benzene ring group, a condensed ring group, or a combination thereof.