CPC G03F 7/11 (2013.01) [C08G 12/26 (2013.01); C08G 16/0268 (2013.01); C09D 161/26 (2013.01); G03F 7/2002 (2013.01); G03F 7/2059 (2013.01); G03F 7/40 (2013.01); H01L 21/0274 (2013.01)] | 8 Claims |
1. A resist underlayer film containing a polymer consisting of unit structure of the following formula (1):
wherein A is a divalent group having at least two amino groups, the divalent group is derived from a compound having an indolocarbazole structure, B1 is a hydrogen atom, and B2 is a hydrogen atom, an alkyl group, a benzene ring group, a condensed ring group, or a combination thereof.
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