US 11,720,019 B2
Resist composition and pattern forming process
Jun Hatakeyama, Joetsu (JP); and Tomomi Watanabe, Joetsu (JP)
Assigned to SHIN-ETSU CHEMICAL CO., LTD., Tokyo (JP)
Filed by Shin-Etsu Chemical Co., Ltd., Tokyo (JP)
Filed on Jan. 25, 2021, as Appl. No. 17/157,011.
Claims priority of application No. 2020-031900 (JP), filed on Feb. 27, 2020.
Prior Publication US 2021/0278763 A1, Sep. 9, 2021
Int. Cl. G03F 7/004 (2006.01); C07C 381/12 (2006.01); G03F 7/038 (2006.01); C07C 65/10 (2006.01); C07C 61/135 (2006.01); C07C 59/115 (2006.01); C07C 205/58 (2006.01); C07C 63/70 (2006.01); C07C 311/03 (2006.01); C07D 275/06 (2006.01); C07C 309/19 (2006.01); C08F 220/18 (2006.01); C08F 212/14 (2006.01); G03F 7/039 (2006.01)
CPC G03F 7/0045 (2013.01) [C07C 59/115 (2013.01); C07C 61/135 (2013.01); C07C 63/70 (2013.01); C07C 65/10 (2013.01); C07C 205/58 (2013.01); C07C 309/19 (2013.01); C07C 311/03 (2013.01); C07C 381/12 (2013.01); C07D 275/06 (2013.01); C08F 212/24 (2020.02); C08F 220/1806 (2020.02); G03F 7/0382 (2013.01); G03F 7/0392 (2013.01); C07C 2603/62 (2017.05); C07C 2603/74 (2017.05)] 15 Claims
 
1. A resist composition comprising a quencher containing a sulfonium salt having the formula (A):

OG Complex Work Unit Chemistry
wherein k, m, and n are each independently an integer of 1 to 3, p is 0 or 1, q is an integer of 0 to 4, r is an integer of 1 to 3,
XBI is iodine or bromine,
Ra1 is a C1-C20 (k+1)-valent aliphatic hydrocarbon group which may contain at least one selected from an ether bond, a carbonyl group, an ester bond, an amide bond, a sultone ring, a lactam ring, a carbonate group, a halogen other than iodine, a C6-C12 aryl group, a hydroxyl group, or a carboxyl group,
X1 is a single bond, an ether bond, an ester bond, an amide bond, a carbonyl group, or a carbonate group,
X2 is a single bond or a C1-C20 (m+1)-valent hydrocarbon group which may contain at least one selected from an ether bond, a carbonyl group, an ester bond, an amide bond, a sultone ring, a lactam ring, a carbonate group, a halogen other than iodine, a hydroxyl group, or a carboxyl group,
X3 is a single bond, an ether bond, or an ester bond,
R1 is a single bond or a C1-C20 saturated hydrocarbylene group which may contain an ether bond, an ester bond, or a hydroxyl group,
R2 is a C1-C20 hydrocarbyl group which may contain a heteroatom, two R2s may be the same or different, and may bond together to form a ring with a sulfur atom to which the two R2s are attached when r=1,
R3 is a hydroxyl group, a carboxyl group, a nitro group, a cyano group, fluorine, chlorine, bromine, iodine, an amino group, or a C1-C20 saturated hydrocarbyl group, C1-C20 saturated hydrocarbyloxy group, C2-C20 saturated hydrocarbylcarbonyloxy group, C2-C20 saturated hydrocarbyloxycarbonyl group, or C1-C4 saturated hydrocarbylsulfonyloxy group which may contain fluorine, chlorine, bromine, iodine, a hydroxyl group, an amino group, or an ether bond, and
Xq− is a halide ion, a sulfonic acid anion not having fluorine at an α-position, a carboxylic acid anion, or a sulfonamide anion.