US 11,720,018 B2
Chemically amplified resist composition and patterning process
Jun Hatakeyama, Joetsu (JP)
Assigned to SHIN-ETSU CHEMICAL CO., LTD., Tokyo (JP)
Filed by Shin-Etsu Chemical Co., Ltd., Tokyo (JP)
Filed on Jul. 16, 2020, as Appl. No. 16/930,539.
Claims priority of application No. 2019-148853 (JP), filed on Aug. 14, 2019.
Prior Publication US 2021/0048747 A1, Feb. 18, 2021
Int. Cl. G03F 7/004 (2006.01); C08L 33/06 (2006.01); G03F 7/039 (2006.01); G03F 7/20 (2006.01); C08L 25/08 (2006.01); G03F 7/038 (2006.01)
CPC G03F 7/0045 (2013.01) [C08L 25/08 (2013.01); C08L 33/06 (2013.01); G03F 7/0382 (2013.01); G03F 7/0392 (2013.01); G03F 7/2004 (2013.01); G03F 7/0048 (2013.01)] 15 Claims
 
1. A chemically amplified resist composition comprising a quencher and an acid generator, the quencher comprising an ammonium salt of an iodine or bromine-substituted phenol.