US 11,720,015 B2
Mask synthesis using design guided offsets
Thomas Cecil, Menlo Park, CA (US); and Kevin Hooker, Austin, TX (US)
Assigned to Synopsys, Inc., Sunnyvale, CA (US)
Filed by Synopsys, Inc., Mountain View, CA (US)
Filed on Jun. 25, 2021, as Appl. No. 17/359,176.
Claims priority of provisional application 63/045,639, filed on Jun. 29, 2020.
Prior Publication US 2021/0405522 A1, Dec. 30, 2021
Int. Cl. G03F 1/70 (2012.01); G06T 7/536 (2017.01); G03F 1/36 (2012.01)
CPC G03F 1/70 (2013.01) [G03F 1/36 (2013.01); G06T 7/536 (2017.01); G06T 2207/10028 (2013.01); G06T 2207/30148 (2013.01)] 20 Claims
OG exemplary drawing
 
1. A method comprising:
obtaining a target shape on an image surface to be fabricated using a mask based on a design of an integrated circuit;
generating rays emanating from respective anchor points, the anchor points being on a boundary of the target shape or a boundary of a mask shape of the mask;
defining, for each ray of the rays, a distance between
a first intersection of the respective ray and the boundary of the target shape and
a second intersection of the respective ray and the boundary of the mask shape;
modifying, by one or more processors, the distance based on an error between the target shape and a resulting shape simulated to be on the image surface resulting from the mask shape; and
generating a mask design for the mask that is to be used to fabricate the target shape on the image surface based on the modified distance.