US 11,719,719 B2
Metrology probe with built-in angle and method of fabrication thereof
Jeffrey Wong, Simi Valley, CA (US); Joseph Fragala, Camarillo, CA (US); Weijie Wang, Thousand Oaks, CA (US); Deepkishore Mukhopadhyay, Ventura, CA (US); Xing Zhao, Camarillo, CA (US); and Rakesh Poddar, Camarillo, CA (US)
Assigned to Bruker Nano, Inc., Santa Barbara, CA (US)
Filed by Bruker Nano, Inc., Santa Barbara, CA (US)
Filed on Jun. 16, 2021, as Appl. No. 17/348,877.
Prior Publication US 2022/0404392 A1, Dec. 22, 2022
Int. Cl. G01Q 60/38 (2010.01); G01Q 70/10 (2010.01); G01Q 70/16 (2010.01)
CPC G01Q 60/38 (2013.01) [G01Q 70/10 (2013.01); G01Q 70/16 (2013.01)] 18 Claims
OG exemplary drawing
 
1. A method of batch-fabricating an array of probe devices for a surface analysis instrument, the method including:
providing a wafer;
photolithographically forming a base and a cantilever for each probe device;
wherein the cantilever includes a built-in angle, θ, relative to the base; and
wherein the providing step includes bonding an off-axis wafer (111) with a substrate wafer.