CPC C10J 3/721 (2013.01) [C10B 1/10 (2013.01); C10B 47/30 (2013.01); C10J 3/005 (2013.01); C10K 3/001 (2013.01); F23G 5/0273 (2013.01); F23G 5/20 (2013.01); C10J 2300/12 (2013.01); C10J 2300/1223 (2013.01); C10J 2300/1246 (2013.01); C10J 2300/1253 (2013.01); F23G 2203/20 (2013.01); F23G 2209/22 (2013.01); F23G 2209/26 (2013.01); F23G 2209/28 (2013.01); F23G 2900/50201 (2013.01)] | 19 Claims |
1. An advanced thermal treatment (ATT) method comprising:
applying heat from a heat source to a first region to cause a first advanced thermal treatment (ATT) process, the first ATT process resulting in a gaseous mixture;
applying heat from the heat source to a second region in the form of a gas enclosure to cause a second ATT process, the second ATT process being applied to a gaseous mixture received from a third region, the gas enclosure having a diameter less than the first region; and
applying heat from the heat source to the third region, coupled in between the first region and the second region, to cause a third ATT process, the third ATT process being applied to the gaseous mixture received from the first region, wherein the third region has a diameter smaller than the first region.
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