US 11,718,014 B2
Imprint apparatus, imprint method, and method of manufacturing article
Tadashi Hattori, Utsunomiya (JP)
Assigned to Canon Kabushiki Kaisha, Tokyo (JP)
Filed by CANON KABUSHIKI KAISHA, Tokyo (JP)
Filed on Apr. 1, 2020, as Appl. No. 16/837,914.
Claims priority of application No. 2019-073610 (JP), filed on Apr. 8, 2019.
Prior Publication US 2020/0316843 A1, Oct. 8, 2020
Int. Cl. B29C 59/02 (2006.01); B29C 59/00 (2006.01); G03F 7/00 (2006.01); B29C 59/16 (2006.01)
CPC B29C 59/02 (2013.01) [B29C 59/002 (2013.01); G03F 7/0002 (2013.01); B29C 59/16 (2013.01)] 7 Claims
OG exemplary drawing
 
1. An imprint apparatus that forms a curable composition on a substrate using a mold, the imprint apparatus comprising:
a first measurement unit including holding mechanism of a probe, configured to measure a first height distribution of the substrate at a contact position where the mold and the curable composition are in contact with each other,
a substrate height sensor configured to measure a second height distribution of the substrate at a non-contact position different from the contact position,
a control device configured to control the first measurement unit and the substrate height sensor,
wherein the first measurement unit measures a height of the substrate by bringing the probe into contact with a surface of the substrate, the probe having a contact surface area smaller than a contact surface area of the mold, and
the control device is configured to correct a tilt of the substrate at the contact position based on the first height distribution and the second height distribution.