US 11,713,506 B2
Evaporator, deposition arrangement, deposition apparatus and methods of operation thereof
Stefan Keller, Mainaschaff (DE); Uwe Schüssler, Aschaffenburg (DE); Jose Manuel Dieguez-Campo, Hanau (DE); Stefan Bangert, Steinau (DE); and Byung-Sung Kwak, Portland, OR (US)
Assigned to Applied Materials, Inc., Santa Clara, CA (US)
Filed by Applied Materials, Inc., Santa Clara, CA (US)
Filed on Nov. 5, 2018, as Appl. No. 16/180,800.
Application 16/180,800 is a division of application No. 14/650,267, abandoned, previously published as PCT/EP2013/077569, filed on Dec. 20, 2013.
Claims priority of application No. 12198683 (EP), filed on Dec. 20, 2012.
Prior Publication US 2019/0071772 A1, Mar. 7, 2019
Int. Cl. C23C 16/448 (2006.01); C23C 14/24 (2006.01); H01M 4/38 (2006.01); C23C 14/54 (2006.01); C23C 14/14 (2006.01); C23C 16/06 (2006.01); C23C 16/455 (2006.01); C23C 16/52 (2006.01)
CPC C23C 16/4485 (2013.01) [C23C 14/14 (2013.01); C23C 14/246 (2013.01); C23C 14/543 (2013.01); C23C 16/06 (2013.01); C23C 16/4557 (2013.01); C23C 16/45519 (2013.01); C23C 16/45561 (2013.01); C23C 16/45565 (2013.01); C23C 16/52 (2013.01); H01M 4/381 (2013.01)] 13 Claims
OG exemplary drawing
 
1. A depositing arrangement for evaporation of a material comprising an alkali metal or alkaline earth metal and for deposition of the material on a substrate disposed in a physical vapor deposition chamber, comprising:
a first chamber configured to liquefy the material, the first chamber having a non-reactive atmosphere, the non-reactive atmosphere preventing a reaction with the material;
a valve being in fluid communication with the first chamber, and being downstream of the first chamber, wherein the valve is configured to control of the flow rate of the liquefied material through the valve and wherein the valve is configured to further provide the liquefied material;
an evaporation zone being in fluid communication with the valve, and being downstream of the valve, wherein the evaporation zone comprises a surface disposed within a plenum defined by inner walls of a vapor distribution showerhead, the surface being heated by a first heating unit disposed in the plenum and configured to provide thermal energy to the material at a temperature suitable for evaporating the material;
a second heating unit to heat the material to higher temperatures before providing the material in the evaporation zone; and
the vapor distribution showerhead comprising one or more outlets to direct the vaporized material towards the substrate.