US 11,713,404 B2
Polishing agent, polishing method, and liquid additive for polishing
Toshihiko Otsuki, Tokyo (JP)
Assigned to AGC INC., Chiyoda-ku (JP)
Filed by AGC INC., Chiyoda-ku (JP)
Filed on May 12, 2021, as Appl. No. 17/318,421.
Application 17/318,421 is a continuation of application No. 16/179,246, filed on Nov. 2, 2018, granted, now 11,041,096.
Claims priority of application No. 2017-215520 (JP), filed on Nov. 8, 2017.
Prior Publication US 2021/0261824 A1, Aug. 26, 2021
Int. Cl. C09G 1/02 (2006.01); H01L 21/321 (2006.01); C09G 1/00 (2006.01); C09G 1/06 (2006.01); C09K 3/14 (2006.01); C09G 1/04 (2006.01); C09K 13/06 (2006.01); B24B 37/04 (2012.01); B24B 1/00 (2006.01); H01L 21/306 (2006.01); H01L 21/3105 (2006.01); H01L 21/304 (2006.01); H01L 21/762 (2006.01)
CPC C09G 1/02 (2013.01) [B24B 1/00 (2013.01); B24B 37/044 (2013.01); C09G 1/00 (2013.01); C09G 1/04 (2013.01); C09G 1/06 (2013.01); C09K 3/1454 (2013.01); C09K 3/1463 (2013.01); C09K 13/06 (2013.01); H01L 21/304 (2013.01); H01L 21/30625 (2013.01); H01L 21/31053 (2013.01); H01L 21/3212 (2013.01); H01L 21/76224 (2013.01)] 16 Claims
OG exemplary drawing
 
1. A polishing agent consisting essentially of:
a water-soluble polymer comprising a copolymer of a monomer (A) which comprises at least one selected from the group consisting of an unsaturated dicarboxylic acid, a derivative thereof, and salts of the unsaturated dicarboxylic acid and the derivative thereof and a monomer (B) other than the monomer (A), comprising an ethylenic double bond and no acidic group;
a cerium oxide particle;
a dispersant which is an ammonium acrylate salt;
a pH regulator; and
water,
wherein:
the polishing agent has a pH of 8.0 to 8.6.