	US 11,713,375 B2
	Barrier material formation composition, barrier material, production method for barrier material, product, and production method for product
Tomohiko Kotake, Tokyo (JP); Tatsuya Makino, Tokyo (JP); and Yuta Akasu, Tokyo (JP)
Assigned to RESONAC CORPORATION, Tokyo (JP)
Appl. No. 16/759,566
Filed by HITACHI CHEMICAL COMPANY, LTD., Tokyo (JP)
PCT Filed Oct. 31, 2018, PCT No. PCT/JP2018/040571 § 371(c)(1), (2) Date Apr. 27, 2020, PCT Pub. No. WO2019/088191, PCT Pub. Date May 9, 2019.
Claims priority of application No. PCT/JP2017/039295 (WO), filed on Oct. 31, 2017.
Prior Publication US 2020/0291189 A1, Sep. 17, 2020
Int. Cl. C08G 77/398 (2006.01); C08J 5/18 (2006.01); C09D 183/04 (2006.01); C08G 77/18 (2006.01); C08G 77/38 (2006.01); C08G 79/10 (2006.01); C08G 77/58 (2006.01)

CPC C08G 77/398 (2013.01) [C08G 77/18 (2013.01); C08G 77/38 (2013.01); C08G 77/58 (2013.01); C08G 79/10 (2013.01); C08J 5/18 (2013.01); C09D 183/04 (2013.01)]

11 Claims

1. A barrier material formation composition comprising a silane monomer selected from the group consisting of alkyltrialkoxysilane, aryltrialkoxysilane, and tetraalkoxysilane, and an oligomer of silane,

at least a part of the oligomer of silane being modified with a metal alkoxide, and the oligomer of silane having a silicon atom bonded to three oxygen atoms,

wherein the content of the silane monomer is 100 parts by mass or less relative to 100 parts by mass of the oligomer of silane.