US 10,363,746 B2
Method for producing liquid ejection head
Kazunari Ishizuka, Suntou-gun (JP)
Assigned to CANON KABUSHIKI KAISHA, Tokyo (JP)
Filed by CANON KABUSHIKI KAISHA, Tokyo (JP)
Filed on Dec. 5, 2017, as Appl. No. 15/831,730.
Claims priority of application No. 2016-247025 (JP), filed on Dec. 20, 2016.
Prior Publication US 2018/0170055 A1, Jun. 21, 2018
Int. Cl. B41J 2/05 (2006.01); B41J 2/16 (2006.01)
CPC B41J 2/1631 (2013.01) [B41J 2/1601 (2013.01); B41J 2/1603 (2013.01); B41J 2/1607 (2013.01); B41J 2/1629 (2013.01); B41J 2/1639 (2013.01); B41J 2/1645 (2013.01); B41J 2202/03 (2013.01)] 12 Claims
OG exemplary drawing
 
1. A method for producing a liquid ejection head that includes a member having an ejection port and a flow path communicating with the ejection port and a substrate having an energy generating element configured to eject a liquid supplied from the flow path through the ejection port, the method comprising:
a step of providing a positive photosensitive resin layer on a substrate;
a step of heat-treating the positive photosensitive resin layer on the substrate;
a step of forming a mold material having a pattern of the flow path by subjecting the heat-treated positive photosensitive resin layer on the substrate to exposure and development;
a step of covering the mold material on the substrate with a negative photosensitive resin layer for forming the member;
a step of forming the ejection port communicating with the mold material by subjecting the negative photosensitive resin layer covering the mold material to i-line irradiation and development treatment; and
a step of forming the flow path communicating with the ejection port by removing the mold material from the substrate,
wherein the positive photosensitive resin layer includes a light absorbing agent that is nonvolatile at a temperature of the heat treatment of the positive photosensitive resin layer, and
the light absorbing agent has “a light absorbance (a1) at a wavelength of 365 nm” and “an average light absorbance (a2) in a wavelength range of 280 nm or more to 330 nm or less”, and an absorbance ratio A is 1.0 or less where the absorbance ratio A is a ratio a2/a1.