US 11,709,404 B2
Display device and method of manufacturing the same
Hyelim Jang, Hwaseong-si (KR); Young Gu Kim, Yongin-si (KR); Jiyun Park, Hwaseong-si (KR); Jongho Son, Seoul (KR); Jongmin Ok, Hwaseong-si (KR); Sun-Young Chang, Seoul (KR); Baekkyun Jeon, Yongin-si (KR); and Kyungseon Tak, Hwaseong-si (KR)
Assigned to Samsung Display Co., Ltd., Yongin-si (KR)
Filed by Samsung Display Co., Ltd., Yongin-Si (KR)
Filed on Sep. 15, 2020, as Appl. No. 17/21,985.
Claims priority of application No. 10-2019-0123815 (KR), filed on Oct. 7, 2019.
Prior Publication US 2021/0103192 A1, Apr. 8, 2021
Int. Cl. G02F 1/1362 (2006.01); G02F 1/1335 (2006.01)
CPC G02F 1/136286 (2013.01) [G02F 1/133514 (2013.01); G02F 1/136277 (2013.01); G02F 2201/123 (2013.01); G02F 2202/022 (2013.01); G02F 2202/42 (2013.01)] 20 Claims
OG exemplary drawing
 
1. A display device comprising:
a base layer;
a first pixel transistor disposed on the base layer;
a first gate line electrically connected to the first pixel transistor;
a first data line electrically connected to the first pixel transistor;
a first insulating layer disposed on the first data line, having an uneven surface, and having a planar surface disposed between the base layer and the uneven surface, wherein the uneven surface overlaps the planar surface;
a first pixel electrode electrically connected to the first pixel transistor and overlapping the first data line in a plan view; and
a porous layer disposed between the first data line and the first pixel electrode,
wherein the porous layer comprises:
a matrix comprising a polymer resin and having a planar face, the planar face overlapping each of the uneven surface of the first insulating layer and the planar surface of the first insulating layer; and
a plurality of void portions disposed in the matrix and disposed between the uneven surface of the first insulating layer and the planar face of the matrix of the porous layer, wherein the plurality of void portions have a volume ratio 10% of a total volume including the matrix and the plurality of void portions.