US 11,708,196 B2
Cap liner comprising a sintered fluoropolymer layer
R. Ray Patrylak, Brooklyn, CT (US)
Assigned to ROGERS CORPORATION, Chandler, AZ (US)
Filed by ROGERS CORPORATION, Chandler, AZ (US)
Filed on Feb. 25, 2020, as Appl. No. 16/800,528.
Claims priority of provisional application 62/812,438, filed on Mar. 1, 2019.
Prior Publication US 2020/0277109 A1, Sep. 3, 2020
Int. Cl. B65D 41/04 (2006.01); B32B 27/06 (2006.01); B32B 27/32 (2006.01); B65D 53/06 (2006.01)
CPC B65D 41/0435 (2013.01) [B32B 27/065 (2013.01); B32B 27/322 (2013.01); B65D 53/06 (2013.01); B32B 2266/025 (2013.01); B32B 2305/026 (2013.01); B32B 2305/80 (2013.01); B32B 2435/00 (2013.01); B65D 2251/20 (2013.01)] 7 Claims
OG exemplary drawing
 
1. A cap liner, comprising:
a sintered plasma etched fluoropolymer layer having a white color; wherein the sintered plasma etched fluoropolymer layer comprises at least one of a poly(tetrafluoroethylene) or a modified poly(tetrafluoroethylene); wherein the sintered plasma etched fluoropolymer layer is free of a filler; wherein a thickness of the sintered plasma etched fluoropolymer layer is 0.02 to 0.4 millimeters; and
a backing layer in the form of a continuous layer; wherein the backing layer comprises a closed cell, compressible foam layer having a porosity of 10 to 70 volume percent based on the total volume of the backing layer; wherein the closed cell, compressible foam material comprises at least one of an elastomer or a polyolefin; wherein a thickness of the backing layer is 0.5 to 3 millimeters; and
wherein the sintered plasma etched fluoropolymer layer is in direct physical contact with the backing layer with no intervening layer located there between;
wherein the sintered plasma etched fluoropolymer layer is free of an etchant residue identifiable by Fourier transform infrared spectroscopy; and
wherein the sintered plasma etched fluoropolymer layer is a solid layer having a porosity of 0 volume percent.