| CPC H01L 22/20 (2013.01) [H01L 21/67253 (2013.01)] | 10 Claims |
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1. A substrate processing method of processing a plurality of substrates through a pre-processing process and a post-processing process, in which at least in the post-processing process, the plurality of substrates are processed in parallel in multiple chambers, the substrate processing method comprising:
performing the post-processing process on the plurality of substrates, which have been processed in the pre-processing process, in parallel in the multiple chambers;
acquiring a characteristic value of each of the substrates after performing the post-processing process for each of the chambers;
calculating an actual value, which is an estimated value of the characteristic value when a processing condition of the post-processing process is adjusted based on a difference between the characteristic value and a target value;
acquiring a correction residual amount, which is a difference between the actual value and the target value for each of the chambers;
calculating an average value of the correction residual amounts of all of the chambers;
correcting a processing condition of the pre-processing process based on the average value of the correction residual amounts;
correcting the processing condition of the post-processing process for each of the chambers based on the average value of the correction residual amounts and the correction residual amount for each of the chambers; and
performing the pre-processing process based on the corrected processing condition of the pre-processing process and performing the post-processing process based on the corrected processing condition of the post-processing process,
wherein the correcting the processing condition of the pre-processing process is performed with reference to a table in which the average value of the correction residual amounts stored in advance and the processing condition of the pre-processing process are associated with each other.
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