US 11,703,772 B2
Recipe selection based on inter-recipe consistency
Arie Jeffrey Den Boef, Waalre (NL); Timothy Dugan Davis, Portland, OR (US); Peter David Engblom, Portland, OR (US); and Kaustuve Bhattacharyya, Veldhoven (NL)
Assigned to ASML NETHERLANDS B.V., Veldhoven (NL)
Filed by ASML NETHERLANDS B.V., Veldhoven (NL)
Filed on Dec. 17, 2020, as Appl. No. 17/124,758.
Application 17/124,758 is a continuation of application No. 16/417,706, filed on May 21, 2019, granted, now 10,901,330.
Application 16/417,706 is a continuation of application No. 15/181,126, filed on Jun. 13, 2016, granted, now 10,338,484.
Claims priority of provisional application 62/181,047, filed on Jun. 17, 2015.
Prior Publication US 2021/0103227 A1, Apr. 8, 2021
Int. Cl. G03F 9/00 (2006.01); G03F 7/00 (2006.01); G01B 11/27 (2006.01)
CPC G03F 9/7069 (2013.01) [G01B 11/272 (2013.01); G03F 7/70633 (2013.01)] 20 Claims
OG exemplary drawing
 
1. A computer program product comprising a non-transitory computer readable medium having instructions therein, the instructions, when executed by a computer system, configured to cause the computer system to at least:
obtain metrology data using each of a plurality of substrate measurement recipes;
determine a parameter for each of the plurality of substrate measurement recipes from the metrology data, wherein the parameter characterizes dependence of the metrology data on an angular distribution of incident electromagnetic radiation used in the substrate measurement recipe;
select at least one substrate measurement recipe from the plurality based on the parameters; and
configure a measurement apparatus or process based on the selected at least one substrate measurement recipe and/or provide a signal representing, or based on, the selected at least one substrate measurement recipe to a tool or system for use by the tool or system in controlling or configuring a measurement process.