US 11,703,768 B2
Lithographic apparatus and related methods
Alisia Mariska Willems-Peters, Eindhoven (NL); Sander Baltussen, Castenray (NL); Zhuangxiong Huang, Eindhoven (NL); Reinier Theodorus Martinus Jilisen, Eindhoven (NL); and Sietse Wijtvliet, Apeldoorn (NL)
Assigned to ASML Netherlands B.V., Veldhoven (NL)
Appl. No. 17/600,340
Filed by ASML Netherlands B.V., Veldhoven (NL)
PCT Filed Mar. 10, 2020, PCT No. PCT/EP2020/056332
§ 371(c)(1), (2) Date Sep. 30, 2021,
PCT Pub. No. WO2020/200664, PCT Pub. Date Oct. 8, 2020.
Claims priority of application No. 19166555 (EP), filed on Apr. 1, 2019.
Prior Publication US 2022/0171298 A1, Jun. 2, 2022
Int. Cl. G03F 7/20 (2006.01); G03F 7/00 (2006.01)
CPC G03F 7/70775 (2013.01) [G03F 7/70916 (2013.01); G03F 7/70933 (2013.01)] 16 Claims
OG exemplary drawing
 
1. An apparatus comprising:
a position monitoring system configured to determine a position of a substrate with respect to a projection system configured to project a radiation beam through an opening in the projection system and onto the substrate, wherein a component of the position monitoring system is located beneath the projection system in use, and wherein the component comprises a reflective surface of an interferometer or a scale of a linear encoder; and
a baffle disposed between the opening and the component.