US 11,703,464 B2
Small-angle x-ray scatterometry
Alex Dikopoltsev, Haifa (IL); Matthew Wormington, Highlands Ranch, CO (US); Yuri Vinshtein, Hadera (IL); and Alexander Krokhmal, Haifa (IL)
Assigned to BRUKER TECHNOLOGIES LTD., Migdal HaEmek (IL)
Filed by Bruker Technologies Ltd., Migdal HaEmek (IL)
Filed on Oct. 20, 2021, as Appl. No. 17/505,696.
Application 17/505,696 is a continuation of application No. 17/254,281, granted, now 11,181,490, previously published as PCT/IB2019/055735, filed on Jul. 4, 2019.
Claims priority of provisional application 62/711,477, filed on Jul. 28, 2018.
Claims priority of provisional application 62/711,478, filed on Jul. 28, 2018.
Claims priority of provisional application 62/711,476, filed on Jul. 28, 2018.
Prior Publication US 2022/0042933 A1, Feb. 10, 2022
Int. Cl. G01N 23/201 (2018.01); G01N 23/207 (2018.01); G01T 1/166 (2006.01); G01N 23/223 (2006.01)
CPC G01N 23/201 (2013.01) [G01N 23/207 (2013.01); G01N 23/223 (2013.01); G01T 1/166 (2013.01); G01N 2223/6116 (2013.01)] 19 Claims
OG exemplary drawing
 
1. A method for evaluating an array of high aspect ratio (HAR) structures on a sample, the method comprises:
illuminating the sample with an x-ray beam along a first axis parallel to within two degrees to the HAR structures in the array;
sensing a first pattern of small angle x-ray scattering (SAXS) scattered from the sample while illuminating the sample along the first axis;
illuminating the sample with the x-ray beam along a second axis that is oblique to the HAR structures in the array;
sensing a second pattern of the SAXS scattered from the sample while illuminating the sample along the second axis; and
extracting information with respect to the HAR structures based on the first and second patterns by removing from the first pattern of the SAXS a contribution of one or more additional repetitive structures on the substrate having an aspect ratio smaller than the HAR structures, responsively to a sensitivity of the second pattern to rotation of the second axis.