US 11,702,730 B2
Strain gauge
Toshiaki Asakawa, Shizuoka (JP); Yuta Aizawa, Shizuoka (JP); Shinya Toda, Shizuoka (JP); Shintaro Takata, Nagano (JP); and Shinichi Niwa, Shizuoka (JP)
Assigned to MINEBEA MITSUMI Inc., Nagano (JP)
Filed by MINEBEA MITSUMI Inc., Nagano (JP)
Filed on Sep. 6, 2022, as Appl. No. 17/929,830.
Application 17/929,830 is a continuation of application No. 16/650,560, granted, now 11,542,590, previously published as PCT/JP2018/035706, filed on Sep. 26, 2018.
Claims priority of application No. 2017-191820 (JP), filed on Sep. 29, 2017.
Prior Publication US 2022/0411915 A1, Dec. 29, 2022
This patent is subject to a terminal disclaimer.
Int. Cl. C23C 14/20 (2006.01); C23C 14/00 (2006.01); C23C 14/06 (2006.01); C23C 14/08 (2006.01); C23C 14/10 (2006.01); G01B 7/16 (2006.01); G01L 1/22 (2006.01)
CPC C23C 14/20 (2013.01) [C23C 14/0063 (2013.01); C23C 14/0652 (2013.01); C23C 14/08 (2013.01); C23C 14/10 (2013.01); G01B 7/16 (2013.01); G01L 1/22 (2013.01); G01L 1/2281 (2013.01)] 7 Claims
OG exemplary drawing
 
1. A strain gauge comprising:
a flexible substrate;
a functional layer formed of a metal, an alloy, or a metal compound, directly on one surface of the substrate; and
a resistor formed of a film that includes Cr, CrN, and Cr2N and that is formed with α-Cr as a main component,
wherein the functional layer includes a function of promoting crystal growth of α-Cr and forming an α-Cr based film.