US 11,696,464 B2
Display panel, manufacturing method thereof and display device
Xuwu Hu, Beijing (CN); Yangsheng Liu, Beijing (CN); Mengxia Kong, Beijing (CN); Yuheng Qiu, Beijing (CN); and Wei Lin, Beijing (CN)
Assigned to CHENGDU BOE OPTOELECTRONICS TECHNOLOGY CO., LTD., Chengdu (CN); and BOE TECHNOLOGY GROUP CO., LTD., Beijing (CN)
Filed by CHENGDU BOE OPTOELECTRONICS TECHNOLOGY CO., LTD., Sichuan (CN); and BOE TECHNOLOGY GROUP CO., LTD., Beijing (CN)
Filed on Jul. 10, 2020, as Appl. No. 16/926,486.
Claims priority of application No. 201911326560.5 (CN), filed on Dec. 20, 2019.
Prior Publication US 2021/0193961 A1, Jun. 24, 2021
Int. Cl. H01L 51/56 (2006.01); H10K 50/844 (2023.01); H10K 59/40 (2023.01); H10K 59/122 (2023.01); H10K 71/00 (2023.01); H10K 59/12 (2023.01)
CPC H10K 50/844 (2023.02) [H10K 59/122 (2023.02); H10K 59/40 (2023.02); H10K 71/00 (2023.02); H10K 59/1201 (2023.02)] 4 Claims
OG exemplary drawing
 
1. A method of manufacturing a display panel, wherein the display panel comprises a display area and a hole forming area, the display area surrounds the hole forming area; the display area comprises: a thin film transistor array layer on a base substrate, a planarization layer covering the thin film transistor array layer, and a pixel defining layer on the planarization layer;
the method comprises:
forming a second organic material sub-layer in the hole forming area and the planarization layer in the display area through a single patterning process;
forming a first organic material sub-layer in the hole forming area and the pixel defining layer in the display area through a single patterning process,
wherein the first organic material sub-layer and the second organic material sub-layer form an organic material layer,
wherein the forming the second organic material sub-layer in the hole forming area and the planarization layer in the display area through the single patterning process comprises:
forming a photosensitive organic material layer;
exposing the photosensitive organic material layer by using a gray-tone mask, wherein the gray-tone mask comprises a partially light-transmitting pattern corresponding to the display area and an opaque pattern corresponding to the hole forming area;
performing a development process to form the second organic material sublayer in the hole forming area and the planarization layer in the display area, wherein a thickness of the second organic material sub-layer is greater than a thickness of the planarization layer in the display area.