US 11,694,820 B2
Radiation source apparatus and method for using the same
Wei-Chung Tu, Hsinchu (TW); Sheng-Kang Yu, Hsinchu (TW); Shang-Chieh Chien, New Taipei (TW); Li-Jui Chen, Hsinchu (TW); and Heng-Hsin Liu, New Taipei (TW)
Assigned to Taiwan Semiconductor Manufacturing Company, Ltd., Hsinchu (TW)
Filed by TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD., Hsinchu (TW)
Filed on Aug. 20, 2021, as Appl. No. 17/407,291.
Claims priority of provisional application 63/185,612, filed on May 7, 2021.
Prior Publication US 2022/0359097 A1, Nov. 10, 2022
Int. Cl. G21K 1/06 (2006.01); G02B 5/08 (2006.01); G02B 5/10 (2006.01); G03F 7/20 (2006.01); H05G 2/00 (2006.01); G03F 7/00 (2006.01)
CPC G21K 1/06 (2013.01) [G02B 5/0808 (2013.01); G02B 5/0891 (2013.01); G02B 5/10 (2013.01); G03F 7/70025 (2013.01); G03F 7/70033 (2013.01); H05G 2/008 (2013.01)] 20 Claims
OG exemplary drawing
 
1. A radiation source apparatus, comprising:
a vessel having an exit aperture;
a laser source disposed at an end of the vessel and configured to emit a laser beam to excite a target material to form a plasma;
a collector disposed in the vessel and configured to collect a radiation emitted by the plasma and to direct the collected radiation to the exit aperture of the vessel; and
a reflective mirror in the vessel and configured to reflect the laser beam toward an edge of the vessel.