CPC G03F 7/70916 (2013.01) [G03F 7/707 (2013.01); G03F 7/70875 (2013.01); H01L 21/67115 (2013.01); H01L 21/67253 (2013.01)] | 20 Claims |
1. A lithography system, comprising:
a radiation source configured to generate a radiation;
a reticle configured to redirect the radiation;
a first type injection nozzle proximal to the reticle and configured to generate a first particle shield in a propagation path of the radiation; and
a second type injection nozzle proximal to the radiation source and configured to generate a second particle shield in the propagation path of the radiation, wherein the second type injection nozzle and the first type injection nozzle are of different types.
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