US 11,693,323 B2
Control apparatus, positioning apparatus, lithography apparatus, and article manufacturing method
Takashi Kurihara, Tochigi (JP)
Assigned to CANON KABUSHIKI KAISHA, Tokyo (JP)
Filed by CANON KABUSHIKI KAISHA, Tokyo (JP)
Filed on Feb. 11, 2022, as Appl. No. 17/669,725.
Claims priority of application No. 2021-027746 (JP), filed on Feb. 24, 2021.
Prior Publication US 2022/0269185 A1, Aug. 25, 2022
Int. Cl. G03F 7/20 (2006.01); G03F 7/00 (2006.01)
CPC G03F 7/70775 (2013.01) 20 Claims
OG exemplary drawing
 
1. A control apparatus for controlling a controlled object, the control apparatus comprising:
a measuring device configured to measure a state of the controlled object; and
a controller configured to generate a manipulated variable corresponding to an output of the measuring device and a target value,
wherein the controller includes:
a compensator, including a neural network, configured to output an index corresponding to the output of the measuring device and the target value; and
a converter configured to convert the index into the manipulated variable such that a probability at which a predetermined manipulated variable is generated is a target probability.