CPC G03F 7/0045 (2013.01) [C07C 309/12 (2013.01); C07C 381/12 (2013.01); C07D 333/76 (2013.01); G03F 7/038 (2013.01); G03F 7/039 (2013.01); C07C 2603/74 (2017.05)] | 20 Claims |
1. A photoacid generator comprising a compound represented by Formula 1:
wherein, in Formula 1,
CY is an unsubstituted C6-C10 aromatic ring group, a C6-C10 aromatic ring group substituted with a halogen atom, a C1-C30 alkyl group, or a C1-C30 haloalkyl group,
A1 and A2 are each independently a substituted C6-C60 aromatic ring group with at least one iodine atom, a substituted C5-C60 heteroaromatic ring group with at least one iodine atom, or A1 and A2 join to form a ring system substituted with at least two iodine atoms, and
B is a counter anion.
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12. A photoresist composition comprising:
the photoacid generator of claim 1;
a base polymer;
a photodegradable quencher (PDQ); and
a solvent.
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