US 11,693,315 B2
Photoacid generator, photoresist composition including the same, and method of preparing the photoacid generator
Eunkyung Lee, Seoul (KR); Sumin Kim, Suwon-si (KR); Hyunwoo Kim, Seongnam-si (KR); Juhyeon Park, Hwaseong-si (KR); Giyoung Song, Asan-si (KR); Sukkoo Hong, Suwon-si (KR); Yoonhyun Kwak, Seoul (KR); Youngmin Nam, Seoul (KR); Byunghee Sohn, Yongin-si (KR); Sunyoung Lee, Seoul (KR); Aram Jeon, Seoul (KR); and Sungwon Choi, Hwaseong-si (KR)
Assigned to SAMSUNG ELECTRONICS CO., LTD., Gyeonggi-do (KR)
Filed by Samsung Electronics Co., Ltd., Suwon-si (KR)
Filed on Apr. 23, 2021, as Appl. No. 17/238,355.
Claims priority of application No. 10-2020-0163340 (KR), filed on Nov. 27, 2020.
Prior Publication US 2022/0171284 A1, Jun. 2, 2022
Int. Cl. G03F 7/004 (2006.01); G03F 7/038 (2006.01); G03F 7/039 (2006.01); C07C 309/12 (2006.01); C07D 333/76 (2006.01); C07C 381/12 (2006.01)
CPC G03F 7/0045 (2013.01) [C07C 309/12 (2013.01); C07C 381/12 (2013.01); C07D 333/76 (2013.01); G03F 7/038 (2013.01); G03F 7/039 (2013.01); C07C 2603/74 (2017.05)] 20 Claims
OG exemplary drawing
 
1. A photoacid generator comprising a compound represented by Formula 1:

OG Complex Work Unit Chemistry
wherein, in Formula 1,
CY is an unsubstituted C6-C10 aromatic ring group, a C6-C10 aromatic ring group substituted with a halogen atom, a C1-C30 alkyl group, or a C1-C30 haloalkyl group,
A1 and A2 are each independently a substituted C6-C60 aromatic ring group with at least one iodine atom, a substituted C5-C60 heteroaromatic ring group with at least one iodine atom, or A1 and A2 join to form a ring system substituted with at least two iodine atoms, and
B is a counter anion.
 
12. A photoresist composition comprising:
the photoacid generator of claim 1;
a base polymer;
a photodegradable quencher (PDQ); and
a solvent.