CPC G03B 13/36 (2013.01) [G02B 7/09 (2013.01); H04N 23/67 (2023.01); H10N 30/03 (2023.02); H10N 30/07 (2023.02); B81B 2201/03 (2013.01); G03B 2205/0053 (2013.01); H10N 30/01 (2023.02)] | 20 Claims |
1. A method, comprising:
forming a supporting layer on a base layer, wherein the supporting layer has a central region and a peripheral region surrounding the central region;
forming a dielectric layer on the supporting layer;
forming a piezoelectric member on the dielectric layer above the peripheral region of the supporting layer in a stacking direction;
patterning the dielectric layer to form a first projection and a second projection in the central region of the supporting layer;
covering the dielectric layer with a membrane, wherein the membrane is conformally formed over the first projection and the second projection;
applying a liquid optical medium over the membrane and sealing the liquid optical medium with a protection layer; and
etching the base layer, the supporting layer and the patterned dielectric layer to expose the membrane.
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8. A method, comprising:
forming a supporting layer on a base layer, wherein the supporting layer has a central region and a peripheral region surrounding the central region;
forming a dielectric layer over the supporting layer;
forming a piezoelectric member on the dielectric layer above the peripheral region of the supporting layer in a stacking direction;
patterning the dielectric layer to form a first projection and a second projection in the central region of the supporting layer;
covering the patterned dielectric layer with a membrane, wherein a first portion of the membrane on a center of the central region of the supporting layer has a top surface lower than a top surface of a second portion of the membrane on the first projection;
applying a liquid optical medium over the membrane and sealing the liquid optical medium with a protection layer; and
etching the base layer, the supporting layer, the first projection, and the second projection to expose the membrane.
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15. A method, comprising:
forming a supporting layer on a base layer, wherein the supporting layer has a central region and a peripheral region surrounding the central region;
forming a dielectric layer on the supporting layer;
forming a piezoelectric member on the dielectric layer above the peripheral region of the supporting layer in a stacking direction;
patterning the dielectric layer to form a first projection and a second projection in the central region of the supporting layer;
forming a membrane to cover the piezoelectric member, the first projection and the second projection, wherein a first portion of the membrane between the first projection and the second projection has a top surface lower than a top surface of a second portion of the membrane on the first projection;
applying a liquid optical medium over the membrane and sealing the liquid optical medium with a protection layer; and
etching the base layer, the supporting layer, the first projection, and the second projection to expose the membrane.
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