US 11,693,295 B2
Auto-focusing device and method of fabricating the same
Ting-Jung Chen, Kaohsiung (TW); and Shih-Wei Lin, Hsinchu (TW)
Assigned to TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD., Hsinchu (TW)
Filed by TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD., Hsinchu (TW)
Filed on Apr. 16, 2020, as Appl. No. 16/850,867.
Claims priority of provisional application 62/868,571, filed on Jun. 28, 2019.
Prior Publication US 2020/0409238 A1, Dec. 31, 2020
Int. Cl. G03B 13/36 (2021.01); G02B 7/09 (2021.01); H04N 23/67 (2023.01); H10N 30/03 (2023.01); H10N 30/07 (2023.01); H10N 30/01 (2023.01)
CPC G03B 13/36 (2013.01) [G02B 7/09 (2013.01); H04N 23/67 (2023.01); H10N 30/03 (2023.02); H10N 30/07 (2023.02); B81B 2201/03 (2013.01); G03B 2205/0053 (2013.01); H10N 30/01 (2023.02)] 20 Claims
OG exemplary drawing
 
1. A method, comprising:
forming a supporting layer on a base layer, wherein the supporting layer has a central region and a peripheral region surrounding the central region;
forming a dielectric layer on the supporting layer;
forming a piezoelectric member on the dielectric layer above the peripheral region of the supporting layer in a stacking direction;
patterning the dielectric layer to form a first projection and a second projection in the central region of the supporting layer;
covering the dielectric layer with a membrane, wherein the membrane is conformally formed over the first projection and the second projection;
applying a liquid optical medium over the membrane and sealing the liquid optical medium with a protection layer; and
etching the base layer, the supporting layer and the patterned dielectric layer to expose the membrane.
 
8. A method, comprising:
forming a supporting layer on a base layer, wherein the supporting layer has a central region and a peripheral region surrounding the central region;
forming a dielectric layer over the supporting layer;
forming a piezoelectric member on the dielectric layer above the peripheral region of the supporting layer in a stacking direction;
patterning the dielectric layer to form a first projection and a second projection in the central region of the supporting layer;
covering the patterned dielectric layer with a membrane, wherein a first portion of the membrane on a center of the central region of the supporting layer has a top surface lower than a top surface of a second portion of the membrane on the first projection;
applying a liquid optical medium over the membrane and sealing the liquid optical medium with a protection layer; and
etching the base layer, the supporting layer, the first projection, and the second projection to expose the membrane.
 
15. A method, comprising:
forming a supporting layer on a base layer, wherein the supporting layer has a central region and a peripheral region surrounding the central region;
forming a dielectric layer on the supporting layer;
forming a piezoelectric member on the dielectric layer above the peripheral region of the supporting layer in a stacking direction;
patterning the dielectric layer to form a first projection and a second projection in the central region of the supporting layer;
forming a membrane to cover the piezoelectric member, the first projection and the second projection, wherein a first portion of the membrane between the first projection and the second projection has a top surface lower than a top surface of a second portion of the membrane on the first projection;
applying a liquid optical medium over the membrane and sealing the liquid optical medium with a protection layer; and
etching the base layer, the supporting layer, the first projection, and the second projection to expose the membrane.