US 11,692,268 B2
Gas diffusion shower head design for large area plasma enhanced chemical vapor deposition
Soo Young Choi, Fremont, CA (US); John M. White, Hayward, CA (US); and Robert I. Greene, Fremont, CA (US)
Assigned to Applied Materials, Inc., Santa Clara, CA (US)
Filed by Applied Materials, Inc., Santa Clara, CA (US)
Filed on Apr. 24, 2014, as Appl. No. 14/261,117.
Application 12/254,742 is a division of application No. 10/823,347, filed on Apr. 12, 2004, abandoned.
Application 14/261,117 is a continuation of application No. 12/254,742, filed on Oct. 20, 2008, granted, now 8,795,793.
Prior Publication US 2014/0230730 A1, Aug. 21, 2014
This patent is subject to a terminal disclaimer.
Int. Cl. C23C 16/455 (2006.01); C23C 16/44 (2006.01); H01J 37/32 (2006.01); B05B 1/00 (2006.01)
CPC C23C 16/45559 (2013.01) [B05B 1/005 (2013.01); C23C 16/4405 (2013.01); C23C 16/45565 (2013.01); H01J 37/3244 (2013.01)] 20 Claims
OG exemplary drawing
 
1. A gas distribution plate assembly, comprising:
a diffuser plate having an upstream side, a downstream side, wherein the diffuser plate has a thickness between about 1.0 inch and about 2.2 inches and an area greater than about 1080 square inches;
a plurality of gas passages passing between the upstream and downstream sides, wherein each of the gas passages comprise:
a first cylindrical section extending from the upstream side;
a first coaxial conical section extending from the downstream side;
a first connecting section connected to the first cylindrical section and a second coaxial cylindrical section;
wherein a ratio of a length of the second coaxial cylindrical section to a length of the first coaxial conical section is between 0.8 and 2.0 and a ratio of a length of the first cylindrical section to a length of the second coaxial cylindrical section is between 0.3 and 1.5; and
a second connecting section connected to the second coaxial cylindrical section and the first coaxial conical section.