US 11,692,263 B2
Coating control using forward parameter correction and adapted reverse engineering
Zhao Yuan, Jiangsu (CN); Markus K. Tilsch, Santa Rosa, CA (US); Georg J. Ockenfuss, Santa Rosa, CA (US); Marius Grigonis, Santa Rosa, CA (US); Andrew Clark, Santa Rosa, CA (US); Donggong Peng, Jiangsu (CN); Yinxiang Xia, Jiangsu (CN); Eric Nybank, Aptos, CA (US); and Neil Pinkerton, Santa Rosa, CA (US)
Assigned to VIAVI Solutions Inc., Chandler, AZ (US)
Appl. No. 16/619,840
Filed by VIAVI Solutions Inc., San Jose, CA (US)
PCT Filed Sep. 28, 2018, PCT No. PCT/CN2018/108297
§ 371(c)(1), (2) Date Dec. 5, 2019,
PCT Pub. No. WO2020/062016, PCT Pub. Date Apr. 2, 2020.
Prior Publication US 2021/0332474 A1, Oct. 28, 2021
Int. Cl. H01J 37/34 (2006.01); C23C 14/54 (2006.01); C23C 14/35 (2006.01); C23C 14/00 (2006.01); C23C 14/52 (2006.01)
CPC C23C 14/547 (2013.01) [C23C 14/0042 (2013.01); C23C 14/35 (2013.01); C23C 14/52 (2013.01); C23C 14/54 (2013.01); H01J 37/3464 (2013.01); H01J 37/3476 (2013.01)] 16 Claims
OG exemplary drawing
 
1. A control device configured to control sputtering of a coating system, comprising:
one or more memories; and
one or more processors, communicatively coupled to the one or more memories, programmed to:
receive design information, wherein the design information identifies desired values for a set of layers of an optical element to be generated during one or more runs;
receive or obtain historic information that indicates a drift of a coating rate over a target life for a single target;
determine layer information for the one or more runs based on the historic information,
wherein the layer information identifies run parameters, for the set of layers, to achieve the desired values;
cause the coating system to perform the sputtering based on the layer information;
determine information identifying a result of the one or more runs,
wherein the information identifying the result is based on at least one spectral measurement of the optical element, and
wherein the information identifying the result indicates one or more of a layer thickness, a spectral characteristic, a filter frequency, a runoff level, a refraction index, or an absorption;
modify, to keep one or more future runs accurate with regard to a desired value of the desired values, a run parameter, of the run parameters, based on whether the result deviates from the desired value,
wherein the run parameter is one of a run time for the set of layers, a gas flow rate, a supply power configuration, a supply power setpoint, or a geometric configuration; and
cause the coating system to perform additional sputtering based on the modified run parameter.