US 11,688,879 B2
Sulfide-based solid electrolyte particles
Tsukasa Takahashi, Ageo (JP); Takashi Chikumoto, Ageo (JP); and Takahiro Ito, Ageo (JP)
Assigned to Mitsui Mining & Smelting Co., Ltd., Tokyo (JP)
Appl. No. 16/979,920
Filed by Mitsui Mining & Smelting Co., Ltd., Tokyo (JP)
PCT Filed Mar. 12, 2019, PCT No. PCT/JP2019/009847
§ 371(c)(1), (2) Date Sep. 11, 2020,
PCT Pub. No. WO2019/176895, PCT Pub. Date Sep. 19, 2019.
Claims priority of application No. JP2018-044210 (JP), filed on Mar. 12, 2018.
Prior Publication US 2021/0013542 A1, Jan. 14, 2021
Int. Cl. H01M 10/00 (2006.01); H01M 10/0562 (2010.01); H01M 4/13 (2010.01); H01M 10/0525 (2010.01); H01M 4/02 (2006.01)
CPC H01M 10/0562 (2013.01) [H01M 4/13 (2013.01); H01M 10/0525 (2013.01); H01M 2004/027 (2013.01); H01M 2004/028 (2013.01)] 13 Claims
OG exemplary drawing
 
1. A sulfide-based solid electrolyte particle, comprising a solid electrolyte particle having a crystal phase of a cubic argyrodite-type crystal structure and comprising lithium (Li), phosphorus (P), sulfur (S) and a halogen (Ha),
wherein the solid electrolyte particle has been subjected to a surface modification treatment in which the solid electrolyte particle is directly exposed to an atmosphere having a dew point of −35° C. to 10° C., the atmosphere reacts with the solid electrolyte particle, and no subsequent drying of the solid electrolyte particle is performed;
a ratio (ZHa2/ZHa1) of an element ratio ZHa2 of the halogen (Ha) at a position, in terms of an SiO2 sputter rate, of 5 nm in depth from the particle surface to an element ratio ZHa1 of the halogen (Ha) at a position, in terms of the SiO2 sputter rate, of 100 nm in depth from the particle surface is higher than 0 and 0.5 or lower, as measured by X-ray photoelectron spectroscopy (XPS); and
a ratio (ZO2/ZA2) of an element ratio ZO2 of oxygen to a total ZA2 of element ratios of phosphorus (P), sulfur (S), oxygen (O) and the halogen (Ha) at the position, in terms of the SiO2 sputter rate, of 5 nm in depth from the particle surface is 0.5 or higher and 1.0 or lower, as measured by XPS.