US 11,688,580 B2
Apparatus of plural charged-particle beams
Xuedong Liu, San Jose, CA (US); Weiming Ren, San Jose, CA (US); Shuai Li, Beijing (CN); and Zhongwei Chen, San Jose, CA (US)
Assigned to ASML Netherlands B.V., Veldhoven (NL)
Filed by ASML Netherlands B.V., Veldhoven (NL)
Filed on Jun. 21, 2021, as Appl. No. 17/353,790.
Application 17/353,790 is a continuation of application No. 16/799,773, filed on Feb. 24, 2020, granted, now 11,043,354.
Application 16/799,773 is a continuation of application No. 16/174,146, filed on Oct. 29, 2018, granted, now 10,573,487, issued on Feb. 25, 2020.
Application 16/174,146 is a continuation of application No. 15/403,685, filed on Jan. 11, 2017, granted, now 10,115,559, issued on Oct. 30, 2018.
Application 15/403,685 is a continuation of application No. 15/150,858, filed on May 10, 2016, granted, now 9,607,805, issued on Mar. 28, 2017.
Claims priority of provisional application 62/160,031, filed on May 12, 2015.
Prior Publication US 2021/0391138 A1, Dec. 16, 2021
This patent is subject to a terminal disclaimer.
Int. Cl. H01J 37/147 (2006.01); H01J 37/28 (2006.01); H01J 37/04 (2006.01); H01J 37/153 (2006.01)
CPC H01J 37/147 (2013.01) [H01J 37/04 (2013.01); H01J 37/153 (2013.01); H01J 37/28 (2013.01); H01J 2237/061 (2013.01); H01J 2237/083 (2013.01); H01J 2237/1532 (2013.01); H01J 2237/1534 (2013.01); H01J 2237/2817 (2013.01)] 20 Claims
OG exemplary drawing
 
1. A source-conversion unit comprising:
a first array having a lens configured to:
deflect an off-axis electron beamlet of a plurality of electron beamlets; and
compensate a first portion of aberrations of a probe spot formed on a sample by the deflected off-axis electron beamlet.