CPC G03F 7/70741 (2013.01) [H01L 21/67359 (2013.01); H01L 21/6831 (2013.01); H01L 21/68742 (2013.01)] | 20 Claims |
1. A method, comprising:
positioning a reticle on a plurality of support pins included on a baseplate of a reticle carrier,
wherein a residual charge on the reticle is discharged through the plurality of support pins when the reticle is positioned on the plurality of support pins,
wherein a distance between the reticle and the baseplate is configured to prevent attraction of particles equal to or greater than a threshold particle size from the reticle carrier to the reticle, and
wherein the distance between the reticle and the baseplate is further configured to satisfy at least one of a discharge rate parameter associated with the reticle or a capacitance parameter associated with the reticle and the baseplate; and
positioning a cover of the reticle carrier over the reticle such that the reticle is enclosed in an inner space formed between the cover and the baseplate.
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