US 11,687,011 B2
Reticle carrier and associated methods
Yen-Hsun Chen, Taipei (TW); Yi-Zhen Chen, Hsinchu (TW); Jhan-Hong Yeh, Hsinchu (TW); Han-Lung Chang, Kaohsiung (TW); Tzung-Chi Fu, Miaoli (TW); and Li-Jui Chen, Hsinchu (TW)
Assigned to Taiwan Semiconductor Manufacturing Company, Ltd., Hsinchu (TW)
Filed by Taiwan Semiconductor Manufacturing Company, Ltd., Hsinchu (TW)
Filed on Aug. 30, 2021, as Appl. No. 17/446,402.
Prior Publication US 2023/0062852 A1, Mar. 2, 2023
Int. Cl. G03F 7/20 (2006.01); G03F 7/00 (2006.01); H01L 21/687 (2006.01); H01L 21/683 (2006.01); H01L 21/673 (2006.01)
CPC G03F 7/70741 (2013.01) [H01L 21/67359 (2013.01); H01L 21/6831 (2013.01); H01L 21/68742 (2013.01)] 20 Claims
OG exemplary drawing
 
1. A method, comprising:
positioning a reticle on a plurality of support pins included on a baseplate of a reticle carrier,
wherein a residual charge on the reticle is discharged through the plurality of support pins when the reticle is positioned on the plurality of support pins,
wherein a distance between the reticle and the baseplate is configured to prevent attraction of particles equal to or greater than a threshold particle size from the reticle carrier to the reticle, and
wherein the distance between the reticle and the baseplate is further configured to satisfy at least one of a discharge rate parameter associated with the reticle or a capacitance parameter associated with the reticle and the baseplate; and
positioning a cover of the reticle carrier over the reticle such that the reticle is enclosed in an inner space formed between the cover and the baseplate.