CPC G02B 27/48 (2013.01) [G01J 3/027 (2013.01); G01J 3/26 (2013.01); G01J 9/02 (2013.01); G01J 11/00 (2013.01); G02F 1/0121 (2013.01); G03F 7/70008 (2013.01); G03F 7/70041 (2013.01); G03F 7/7055 (2013.01); H01S 3/0085 (2013.01); H01S 3/225 (2013.01); H01S 4/00 (2013.01); G01J 2009/0211 (2013.01); G02B 19/0095 (2013.01); G02F 2203/18 (2013.01); G03F 7/70025 (2013.01); G03F 7/70583 (2013.01); H01S 3/0057 (2013.01)] | 20 Claims |
1. An apparatus comprising:
an optical source configured to produce a light beam made up of pulses and having a wavelength in the deep ultraviolet range, each pulse having a first temporal coherence defined by a first temporal coherence length and each pulse being defined by a pulse duration;
a coherence reduction system in the path of the light beam of pulses and configured to, for each of the pulses in the light beam, modulate an optical phase over the pulse duration of the pulse to produce a modified pulse having a second temporal coherence defined by a second temporal coherence length that is less than the first temporal coherence length of the pulse; and
a beam directing apparatus in the path of a light beam of pulses formed from the modified pulses, the beam directing apparatus configured to direct the light beam of pulses formed from the modified pulses toward a substrate within a lithography exposure apparatus.
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