CPC G01R 31/2879 (2013.01) [G01N 27/041 (2013.01); G01R 31/2874 (2013.01)] | 22 Claims |
1. An exposure monitor device comprising:
a dielectric substrate;
one or both of a diffusant reservoir and a diffusion region formed in or on the dielectric substrate, wherein the diffusant reservoir comprises a diffusant at a higher concentration relative to the diffusion region such that an exposure of the exposure monitor device to a stress condition causes atomic diffusion of the diffusant from the diffusant reservoir into the diffusion region; and
one or more measurement structures configured for measuring a signature indicative of the atomic diffusion caused by the exposure to the stress condition.
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